Method for processing electron beam sources

Details Method for processing electron beam sources Method for processing electron beam sources

1998-04-07

1999-10-19

Westin, Edward P.

Radiant energy

Ion generation

Methods

313310, 313311, H01J 114

Patent

active

059693630

ABSTRACT:
A method of processing electron emitting devices for electron beam sources, wherein the electrons emitted from the electron beam source have an axial symmetric distribution of emitted electrons include determining a crystal axis direction of the crystal bar used as the material for the electron beam source, and cutting out chip material in such a manner that the longitudinal direction of the axis of the electron emitting device coincides with the crystal axis direction of the crystal bar. As a result, the emitted electrons becomes symmetrical to the axial direction, forming an axially symmetrical distribution, and a uniform electron irradiation on a specimen can be achieved in electron microscopes, electron beam inspection and measuring apparatus, electron lithography systems, and the like.

REFERENCES:
patent: 5341063 (1994-08-01), Kumar
patent: 5463271 (1995-10-01), Geis et al.

Affiliated with

Also associated with

Rating

Method for processing electron beam sources does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for processing electron beam sources, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for processing electron beam sources will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2058976