Method for processing a thin film using an energy beam

Details Method for processing a thin film using an energy beam Method for processing a thin film using an energy beam

1994-08-30

1996-12-03

Bowers, Jr., Charles L.

Fishing, trapping, and vermin destroying

437907, 437174, 117904, 148DIG90, 1566511, H01L 21268, H01L 2184

Patent

active

055808018

ABSTRACT:
A thin film on a substrate is patterned so as to include an area in which a thin film transistor is to be formed and an area of another patterned thin film or a semiconductor device, and so as to have a size larger than the total size of the areas. Next, the patterned thin film is annealed. After the annealing, a part of the inside area of the patterned thin film is patterned. The part of the thin film is used for forming a thin film transistor.

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