Coating processes – Coating by vapor – gas – or smoke – Plural coatings applied by vapor – gas – or smoke
Reexamination Certificate
2004-03-31
2008-09-02
Meeks, Timothy (Department: 1792)
Coating processes
Coating by vapor, gas, or smoke
Plural coatings applied by vapor, gas, or smoke
C427S250000, C427S230000, C427S255110
Reexamination Certificate
active
07419702
ABSTRACT:
A method for processing a substrate on a ceramic substrate heater in a process chamber. The method includes forming a protective coating on the ceramic substrate heater in the process chamber and processing a substrate on the coated substrate heater. The processing can include providing a substrate to be processed on the coated ceramic substrate heater, performing a process on the substrate by exposing the substrate to a process gas, and removing the processed substrate from the process chamber.
REFERENCES:
patent: 4248943 (1981-02-01), Ludwig et al.
patent: 4894257 (1990-01-01), Smith et al.
patent: 5695832 (1997-12-01), Hirano et al.
patent: 5705080 (1998-01-01), Leung et al.
patent: 5952060 (1999-09-01), Ravi
patent: 6197628 (2001-03-01), Vaartstra et al.
patent: 6413321 (2002-07-01), Kim et al.
patent: 6452775 (2002-09-01), Nakajima
patent: 6610568 (2003-08-01), Marsh et al.
patent: 6869876 (2005-03-01), Norman et al.
patent: 2001/0037769 (2001-11-01), Fukuda et al.
patent: 2002/0025627 (2002-02-01), Marsh et al.
patent: 2002/0072211 (2002-06-01), Itatani et al.
patent: 2003/0064225 (2003-04-01), Ohashi et al.
patent: 2003/0129306 (2003-07-01), Wade et al.
patent: 2003/0165620 (2003-09-01), Wakabayashi et al.
patent: 0440384 (1991-08-01), None
Konyashin et al.,Thin Films Comparable with WC-Co Cemented Carbides as Underlayers for Hard and Superhard Coatings: The State of the Art, Diamond and Related Materials vol. 5, Apr. 1996, 575-579.
European Patent Office,International Search Report, PCT/US2005/004905, Aug. 26, 2005, 4 pp.
Kawano Yumiko
Leusink Gert
Malhotra Sandra G.
McFeely Fenton R.
Mosca Enrico
International Business Machines Corp.
Meeks Timothy
Turocy David
Wood Herron & Evans LLP
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