Method for process control of semiconductor manufacturing...

Data processing: measuring – calibrating – or testing – Measurement system – Performance or efficiency evaluation

Reexamination Certificate

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C702S034000, C702S081000, C700S110000, C714S025000, C714S048000, C324S512000, C324S701000

Reexamination Certificate

active

07062411

ABSTRACT:
A method of fault identification on a semiconductor manufacturing tool includes monitoring tool sensor output, establishing a fingerprint of tool states based on the plurality of sensors outputs, capturing sensor data indicative of fault conditions, building a library of such fault fingerprints, comparing present tool fingerprint with fault fingerprints to identify a fault condition and estimating the effect of such a fault condition on process output. The fault library is constructed by inducing faults in a systematic way or by adding fingerprints of known faults after they occur.

REFERENCES:
patent: 5479340 (1995-12-01), Fox et al.
patent: 5926690 (1999-07-01), Toprac et al.
patent: 6174450 (2001-01-01), Patrick et al.
patent: 6192287 (2001-02-01), Solomon et al.
patent: 6262550 (2001-07-01), Kliman et al.
patent: 6393373 (2002-05-01), Duyar et al.
patent: 6441620 (2002-08-01), Scanlan et al.
patent: 6586265 (2003-07-01), Chiou et al.
patent: 6671818 (2003-12-01), Mikurak
patent: 6772633 (2004-08-01), Terry et al.
patent: 2003/0042861 (2003-03-01), Schwartz et al.
patent: 0 878 842 (1998-11-01), None
patent: WO 01/99145 (2001-12-01), None
Schaik et al., ‘Conditon Based Maintenance on MV Cable Circuits as Part of Asset Management Philosophy, Diagnostic Methods, Experiences, Results and the Future’, Jun. 2001, IEEE Artile, No. 482, pp. 1-5.
James et al., ‘Development of Computer-Based Measurements and their Applications to PD Pattern Analysis’, Oct. 1995, IEEE Article, vol. 2, No. 5, pp. 838-856.
Ison et al., ‘Fault Diagnosis of Plasma Etch Equipment’, Jun. 1998, Berkeley University, pp. 1-4.

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