Method for prevention of increase in particles in copolymer...

Details Method for prevention of increase in particles in copolymer... Method for prevention of increase in particles in copolymer...

2005-09-12

2008-03-11

Boykin, Terressa (Department: 1796)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Treating polymer containing material or treating a solid...

C524S150000, C525S082000, C525S083000, C525S084000, C526S085000

Reexamination Certificate

active

07342087

ABSTRACT:
A method for prevention of increase in particles in copolymer for semiconductor resist, which comprises passing, through a filter containing a resin having an amino group and/or an amide bond a copolymer solution for semiconductor resist which contains a copolymer for semiconductor resist having a polar group-containing recurring unit and an alicyclic structure-containing recurring unit and which contains no ionic additive. With the method, there can be obtained a copolymer semiconductor resist, which can be suitably used in a resist film used for formation of a fine pattern in semiconductor production and which is very low in formation of particle s during storage and accordingly generates substantially no defect after development.

REFERENCES:
patent: 6641670 (2003-11-01), Tsujii et al.

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