Method for preventing arcing in a device during ion-implantation

Details Method for preventing arcing in a device during ion-implantation Method for preventing arcing in a device during ion-implantation

1985-09-12

1986-06-17

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37317

Patent

active

045958378

ABSTRACT:
There is disclosed herein an ion implantation apparatus providing for electron flooding during ion implantation to not only neutralize the positive space-charge on an ion beam but also provide a slightly negative space-charge on the beam whereby accumulated positive charges on an insulated device is obviated and only harmless negative charges remain.

REFERENCES:
patent: 3507709 (1970-04-01), Bower
patent: 3908183 (1975-09-01), Ennis, Jr.
patent: 4011499 (1977-03-01), Ko et al.
patent: 4118630 (1978-10-01), McKenna et al.
patent: 4135097 (1979-01-01), Forneris et al.
patent: 4283631 (1981-08-01), Turner
patent: 4361762 (1982-11-01), Douglas
patent: 4383180 (1983-05-01), Turner
Wu et al., RCA Review, vol. 44, Mar. 1983.
Varian Manual of DF-3000 Ion Implanter, Varian/Extrion Division Gloucester, MA.

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