Method for preparing vaporized reactants for chemical vapor depo

Details Method for preparing vaporized reactants for chemical vapor depo Method for preparing vaporized reactants for chemical vapor depo

1990-10-04

1992-02-25

Lindsay, Robert L.

Glass manufacturing

Processes

With coating

65 608, 427167, 4272551, 427314, C03C 17245

Patent

active

050909851

ABSTRACT:
Vaporized reactants, useful for chemical vapor deposition of a coating on the surface of a hot substrate, are prepared by initially heating a liquid coating precursor, injecting the liquid coating precursor into a vaporization chamber, simultaneously admitting a blend gas into the vaporization chamber, heating the liquid and blend gas to cause the liquid to vaporize at a temperature below its standard vaporization temperature, and thoroughly mixing the coating precursor vapor and blend gas, to produce a stream of vaporized reactant for pyrolytic decomposition at the surface of the hot substrate. A horizontal thin film evaporator provides a particularly suitable vaporization chamber for the present process.

REFERENCES:
patent: 2815299 (1957-12-01), Raymond
patent: 3414428 (1968-12-01), Kelly et al.
patent: 3535103 (1970-10-01), Whitfield
patent: 4082864 (1978-07-01), Kendall et al.
patent: 4212663 (1980-07-01), Aslami

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