Method for preparing transparent, electrically conducting indium

Details Method for preparing transparent, electrically conducting indium Method for preparing transparent, electrically conducting indium

1982-01-18

1983-08-23

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

C23C 1500

Patent

active

044002548

ABSTRACT:
Indium-tin alloy targets are high-frequency cathode sputtered using water vapor with a pressure of between 10.sup.-3 mbar and 5.times.10.sup.-3 mbar as the reaction gas. The temperature-sensitive substrates used are water-cooled during the deposition. This is a continuation of application Ser. No. 168,244 filed July 10, 1980, now abandoned.

REFERENCES:
patent: 4010291 (1977-03-01), Katsube et al.
W. Molzen, "Characterization of Transparent Conductive Films of Indium Oxide", J. Vac. Sci. Technol., vol. 12, pp. 98-102 (1975).
K. Itoyama, "Properties of Sn-Doped Indium Oxide Coatings Deposited on Polyester Film by High Rate Reactive Sputtering", J. Electrochem. Soc., vol. 126, pp. 691-694 (1979).

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