Method for preparing substrates for optical sensors

Details Method for preparing substrates for optical sensors Method for preparing substrates for optical sensors

1987-05-26

1988-10-11

Lindsay, Robert L.

Glass manufacturing

Processes

With chemically reactive treatment of glass preform

65111, 156663, 501 66, C03C 1500

Patent

active

047768690

ABSTRACT:
Bodies of borosilicate glass with a B.sub.2 O.sub.3 content of less than 13 percent by weight are provided with a microporous layer of a thickness of 5 to 20 .mu.m, and are thus turned into carriers for optical sensors. This process is characterized by the following steps. Thermal decomposition for 5 to 10 days at 500.degree. to 560.degree. C.; removal of the topmost layer of glass to a depth of at least 10 .mu.m in the part of the surface to be rendered porous; leaching of the separated borate phase with diluted mineral acids for a minimum of 2 days at 70.degree. to 98.degree. C.; and after-treatment of the microporous layer, including (a) chemical treatment with concentrated sulphuric acid and concentrated nitric acid for 2 hours at 20.degree. C., and (b) heat-treatment for 10 minutes to 2 hours at 450.degree. to 700.degree. C.

REFERENCES:
patent: 2221709 (1940-11-01), Hood et al.
patent: 3113855 (1963-12-01), Elmer
patent: 4080188 (1978-03-01), Doddato et al.
patent: 4657875 (1987-04-01), Nakashima

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