Method for preparing solid precursor tray for use in solid...

Coating processes – Solid particles or fibers applied – Uniting particles to form continuous coating with...

Reexamination Certificate

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C427S189000, C427S593000, C427S250000, C419S001000, C419S011000, C419S017000, C419S018000

Reexamination Certificate

active

07488512

ABSTRACT:
In a solid precursor evaporation system configured for use in a thin film deposition system, such as thermal chemical vapor deposition (TCVD), a method for preparing one or more trays of solid precursor is described. The solid precursor may be formed on a coating substrate, such as a tray, using one or more of dipping techniques, spin-on techniques, and sintering techniques.

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