Etching a substrate: processes – Adhesive or autogenous bonding of two or more...
Patent
1997-11-17
2000-03-28
Powell, William
Etching a substrate: processes
Adhesive or autogenous bonding of two or more...
216 39, 216 52, 216 60, 216 66, 216 85, 438 8, 438691, 438745, B44C 122, H01L 2100
Patent
active
060427361
ABSTRACT:
The present invention provides a method for preparing samples for microscopic examination that requires a glass slide to be laminated to a sample substrate by an adhesive layer for polishing in a sample polishing process. A cavity can be first formed in the surface of the substrate by a focused ion beam technique to reveal a characteristic feature which needs to be examined. A wax-based material is then used to fill the cavity and to protect the characteristic feature before an adhesive layer is applied on top of the substrate for bonding a glass slide to the substrate. After the sample is sectioned in the polishing process to reveal a new cross-section that contains the characteristic feature, the protective coating of the wax-based material can be removed by a suitable solvent such that the characteristic feature is ready for microscopic examination. A suitable wax-based material can be a wax that is similar to a candle wax which can be easily removed by acetone.
REFERENCES:
patent: 4389280 (1983-06-01), Mueller et al.
patent: 5064498 (1991-11-01), Miller
patent: 5662814 (1997-09-01), Sugino
Powell William
Taiwan Semiconductor Manufacturing Co. Ltd.
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