Method for preparing lithographically sensitive branched novolak

Details Method for preparing lithographically sensitive branched novolak Method for preparing lithographically sensitive branched novolak

1989-05-12

1990-07-03

Foelak, Morton

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From phenol, phenol ether, or inorganic phenolate

528149, 528210, 522166, 522146, 430270, C08G 816, C08G 1602

Patent

active

049392298

ABSTRACT:
A method for preparing branched novolak polymers possessing excellent lithographic performance is provided. The method involves the acid catalyzed reaction of a phenol with a tris- or tetrakis(dialkylaminoalkyl)phenol followed by purification of the reaction product. The branched novolaks are soluble in aqueous base and organic solvent solutions and are particularly useful as the polymeric component of either positive acting or negative acting photoresist compositions.

REFERENCES:
patent: 2147789 (1939-02-01), Graves
patent: 2431011 (1947-11-01), Zimmer et al.
patent: 2636019 (1953-04-01), Butler
patent: 4468507 (1984-08-01), Parker
patent: 4474929 (1984-10-01), Schrader
H. A. Bruson and C. W. MacMullen, J. Am-Chem. Soc., vol. 63, p. 270 (1941).

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