Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1998-01-20
2000-04-18
Green, Anthony
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
2523014F, 2523014R, 252587, 4233271, 4233301, 501127, 501128, 501153, 428917, C09K 1108, C01B 3326
Patent
active
060512024
ABSTRACT:
A process for preparing far-infrared radiating material. More particularly, this invention relates to a process for preparing far-infrared radiating material which makes maximum use of thermal radiation with a higher specific surface area. The present invention comprises the steps of preparing ultra-fine aluminum silicate salt for nucleus material, adding a silicate gel to said nucleus material, and then adding AlCl.sub.3, FeCl.sub.2, and MnCl.sub.2 to resulting mixture and neutralizing the resulting mixture with an ammonia solution. The present invention can be applied to vinyl films for agricultural use, wrappers, paint for cars, drying, heating, facilitation of fermentation, maturation of liquors, medical treatment, etc.
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