Method for preparing cylcohexylamine

Organic compounds -- part of the class 532-570 series – Organic compounds – Amino nitrogen containing

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C07C20972

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active

057146357

ABSTRACT:
The present invention is related to a method for preparation of cyclohexylamine by hydrogenating aniline at a temperature of 150.degree. to 250.degree. C. under a hydrogen pressure of 1 to 20 atm in the presence of a catalyst selected from a chromium- or thorium- modified cobalt boride, wherein the amount of said modified cobalt boride is at least 0.6 wt % based on the weight of aniline.
Compared with the prior art which used a conventional hydrogenation catalyst such as ruthenium, palladium, Raney cobalt or Raney nickel, the method adopted by the present invention has the advantages in that it can be performed under a relatively lower hydrogen pressure without necessity of adding any coupling inhibitors and a much higher aniline conversion and a higher or comparable selectivity to cyclohexylamine can be obtained, thus resulting in greatly increased yield of cyclohexylamine.

REFERENCES:
patent: 3891707 (1975-06-01), Waddan
patent: 4384142 (1983-05-01), Merten et al.
patent: 4914239 (1990-04-01), Kiyuma et al.
patent: 4935505 (1990-06-01), Townsend et al.
patent: 4943549 (1990-07-01), Immel et al.
patent: 5023226 (1991-06-01), Immel et al.
patent: 5599997 (1997-02-01), Hearn et al.
patent: 5637593 (1997-06-01), Porter et al.

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