Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2011-08-09
2011-08-09
Turner, Archene (Department: 1784)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298130
Reexamination Certificate
active
07993503
ABSTRACT:
Method of producing a target by thermal spraying, especially by plasma spraying, said target comprising at least one compound based on atoms of different types chosen especially from the constituents M belonging to the (Zr, Mo, Ti, Nb, Ta, Hf, Cr) family and silicon, characterized in that at least one fraction of said compound, the constituents of which are bonded by covalent and/or ionic and/or metallic bonds, is injected into a plasma jet, said plasma jet spraying the constituents of said compound onto the target so as to deposit a coating of said compound on a surface portion of said target.
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Billieres Dominique
Nadaud Nicolas
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Saint-Gobain Glass France
Turner Archene
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