Semiconductor device manufacturing: process – Forming bipolar transistor by formation or alteration of... – Permeable or metal base
Patent
1994-06-09
2000-02-15
Kunemund, Robert
Semiconductor device manufacturing: process
Forming bipolar transistor by formation or alteration of...
Permeable or metal base
438352, 438405, 147DIG107, H01L 2354
Patent
active
06025243&
ABSTRACT:
A deposited film formation method comprises the steps of:
REFERENCES:
patent: 4876112 (1989-10-01), Kaito et al.
patent: 5218232 (1993-06-01), Yuzurihara et al.
Ikeda Osamu
Matsumoto Shigeyuki
Ohmi Kazuaki
Canon Kabushiki Kaisha
Kunemund Robert
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