Method for preparing a H2-rich gas and a CO2-rich gas at...

Chemistry of inorganic compounds – Carbon or compound thereof – Oxygen containing

Reexamination Certificate

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C252S373000, C423S651000, C423S652000

Reexamination Certificate

active

06899859

ABSTRACT:
The present invention concerns a method for preparing a CO2-rich gas stream for injection purposes or deposition, and a hydrogen rich gas stream, the method comprising the following steps: a) natural gas and H2O are fed into a one-step reforming process for preparing a gas mixture comprising CO2and H2under supercritical condition for water from about 400° C. to about 600° C. and pressure from about 200 to about 500 bar in the reforming reactor; b) the gas mixture from a) is separated into a H2-rich and CO2-rich gas stream, respectively. The invention also comprises use of CO2-rich gas stream for injection into marine formations, and use of H2-rich stream for hydrogenation, as a source of energy/fuel in fuel cells and for production or electricity.

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patent: 9829333 (1998-07-01), None

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