Stock material or miscellaneous articles – Composite – Of metal
Patent
1996-12-04
1998-08-18
Nakarani, D. S.
Stock material or miscellaneous articles
Composite
Of metal
4284735, B32B 1508
Patent
active
057956553
ABSTRACT:
A method for blending fluorine into a polyimide free of fluorine comprises the steps of generating fluorine radicals in a fluorine based gas, removal of any charge particles from the gas to leave the fluorine radicals in the gas, and exposing a polyimide free of fluorine to an irradiation of the fluorine radicals so that the irradiated fluorine radicals penetrate into and inside the polyimide without showing any reaction to the removed charge particles on a surface of the polyimide.
REFERENCES:
S-Y. Wu, "Dielectric and Chemical Modifications in Polyimide Films Etched in O.sub.2 /CF.sub.4 Plasmas", J. Vac. Sci. Technol., Jul./Aug. 1993, vol. 11, No. 4, pp. 1337-1345.
E. Onyiriuka, "Effects of O.sub.2, Air, and CF.sub.4 Plasmas on Poly(etherketone) Surfaces", J. Vac. Sci. Technol., Nov./Dec. 1993, vol. 11, No. 6, pp. 2941-2944.
"Flouro-Containing Polyimide Blends: Prediction and Experiments", Journal of Polymer Science: Part A: Polymer Chemistry, 1991, vol. 29, pp. 1207-1212.
Y. Misawa et al., "A New Multilevel Interconnection System for Submicrometer VLSI's Using Multilayered Dielectrics of Plasma Silicon Oxide and Low-Thermal-Expansion Polyimide", IEEE Transactions on Electron Devices, Mar. 1987, vol. ED-34, No. 3, pp. 621-627.
Nakarani D. S.
NEC Corporation
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