Method for predicting a critical dimension of a feature...

Details Method for predicting a critical dimension of a feature... Method for predicting a critical dimension of a feature...

2006-02-14

2008-10-28

Rutledge, Della J. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S077000, C430S030000

Reexamination Certificate

active

07443486

ABSTRACT:
A lithographic apparatus includes an illuminator configured to condition a beam of radiation and a support configured to hold a patterning device. The patterning device is configured to pattern the beam of radiation according to a desired pattern. The lithographic apparatus also includes a substrate table configured to hold a substrate and a projection system configured to project the patterned beam onto a target portion of the substrate to form a patterned image on the substrate. The apparatus further includes a sensor configured and arranged to intercept a portion of the beam and to measure a transmission of the beam through at least a portion of the patterning device.

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