Method for precision cleaning and drying surfaces

Drying and gas or vapor contact with solids – Process – Diverse types of drying operations

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

34433, 134 10, F26B 700

Patent

active

057491593

ABSTRACT:
This invention pertains to a substrate cleaner and dryer or a dryer alone, and in particular, to an improved method of isopropyl alcohol (IPA) vapor drying having "closed loop" processing and capability to process extremely large substrates. The invention uses an inert gas, typically nitrogen (N.sub.2) or argon (Ar), as a process gas for carrying the vapor of a drying fluid in a "closed loop" cycle through a process vessel. The carrier gas and is pumped through a vapor generator and the process vessel in a rapid "closed loop" manner with extremely pure IPA vapor. Various embodiments employ the invention including two different vapor drying methods, a water rinse and vapor dry method and a solvent clean and vapor dry method. In either the water rinse and vapor dry method and a solvent clean and vapor dry method rinse water or cleaning fluid is rapidly drained in an unimpeded manner from the vessel while the process vessel is vented.

REFERENCES:
patent: 4777970 (1988-10-01), Kushuhara
patent: 4778532 (1988-10-01), McConnell et al.
patent: 4868996 (1989-09-01), Ohmori et al.
patent: 4911761 (1990-03-01), McConnell et al.
patent: 4917123 (1990-04-01), McConnell et al.
patent: 4977688 (1990-12-01), Roberson, Jr. et al.
patent: 4984597 (1991-01-01), McConnell et al.
patent: 5052126 (1991-10-01), Moe et al.
patent: 5054210 (1991-10-01), Schumacher et al.
patent: 5055138 (1991-10-01), Slinn
patent: 5226242 (1993-07-01), Schwenkler
patent: 5249371 (1993-10-01), Saito et al.
patent: 5288333 (1994-02-01), Tanaka et al.
patent: 5304253 (1994-04-01), Grant
patent: 5503681 (1996-04-01), Inada et al.
patent: 5520744 (1996-05-01), Fujikawa et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for precision cleaning and drying surfaces does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for precision cleaning and drying surfaces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for precision cleaning and drying surfaces will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-970996

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.