Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1997-12-19
1999-12-28
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
430 30, 216 2, 216 12, G03F 900
Patent
active
060079517
ABSTRACT:
The present invention provides a method for precise alignment of a photomask with the crystalline lattice structure of a semiconductor wafer. An etchmask including a predetermined window configuration is used to etch an alignment guide into the semiconductor substrate. The window configuration includes a plurality of pattern units and a straight, elongated alignment window, each of which has an angular offset with respect to the alignment window. The pattern units are analyzed after etching to determine the pattern unit having the most uniform undercutting. All subsequent photomasks include an alignment array having a plurality of alignment vernier. The vernier corresponding to the pattern unit having the most uniform undercutting is selected for aligning with the long alignment V-groove.
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VLSI Fabrication Principles, Silicon and Gallium Arsenide, Sorab K. Ghandhi, pp. 487 through 490.
Micromachining and Micropackaging of Transducers, 1985, "Submicron Accuracies in Anistropic Etched Silicon Piece Parts--A Case Study", T. L. Poteat, pp. 151 through 158.
Schramm Jeff
Tan Songshen
The Whitaker Corporation
Young Christopher G.
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