Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2008-05-20
2008-05-20
Desire, Gregory M (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S149000, C700S110000, C700S121000, C716S030000
Reexamination Certificate
active
07376260
ABSTRACT:
A method for performing post-optical proximity correction (OPC) multi layer overlay quality inspection includes the steps of generating a virtual target mask for a first mask and a second mask overlay using design rules at least partially defining the relationship between the first mask and the second mask; creating a composite aerial image representing a first mask image formed from the first mask and a second mask image formed by the second mask by performing imaging of the first mask and the second mask and overlaying the second mask image onto the first mask image; generating an overlay image map of the composite aerial image using the design rules at least partially defining the relationship between the first mask and the second mask; and comparing the overlay image map area and the virtual target mask area.
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Belova Nadya
Callan Neal
Desire Gregory M
LSI Logic Corporation
Suiter Swantz pc llo
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