Stock material or miscellaneous articles – Self-sustaining carbon mass or layer with impregnant or...
Patent
1995-06-07
1998-08-18
Turner, Archene
Stock material or miscellaneous articles
Self-sustaining carbon mass or layer with impregnant or...
428701, 428702, 428141, G11B 1100
Patent
active
057956537
ABSTRACT:
A process and apparatus for polishing diamond or carbon nitride. A reaction and polishing take place at the interface between an oxygen superionic conductor (yittria-stabilized zirconia) and the diamond or carbon nitride. Oxygen anions are transported to the interface under the influence of a chemical gradient and react with the diamond or carbon nitride. Other mechanisms, such as an electric field and/or heat, that increase the partial pressure of oxygen on the opposing side of the interface of reaction can be used to accelerate the reaction time. The process may be undertaken at low temperatures and without mechanical motion, making it an attractive and useful polishing method. In addition, there is no residue of the polishing process which needs to be removed and polishing can be accomplished in ambient air.
REFERENCES:
patent: 4540452 (1985-09-01), Croset et al.
patent: 4661176 (1987-04-01), Manasevit
patent: 4707384 (1987-11-01), Schachner et al.
patent: 5006203 (1991-04-01), Purdes
patent: 5082522 (1992-01-01), Purdes et al.
patent: 5144380 (1992-09-01), Kimoto et al.
patent: 5314652 (1994-05-01), Simpson et al.
A. Bhattacharyya, "Repairing Potential Gate Oxide Failure Sites and Development of 100% Defect-Free Gate Insulation," IBM Technical Disclosure Bulletin,vol. 15, No. 11, p. 3445, 1973.
E.A. Giess et al., "Oxygen Content Control in Superconducting Oxides," Research Disclosure,No. 299, Kenneth Mason Publications, Ltd., 1989.
Z. Tainji et al., "Diamond Film Polishing with Argon and Oxygen Ion Beams," SPIE,vol. 1325 Diamond Optics III, pp. 142-151, 1990.
X.H. Wang, et al., "Infared Measurements of CVD Diamond Films," SPIE,1325 Diamond Optics III, pp. 160-167, 1990.
M. Yoshikawa, "Development and Performance of a Diamond Film Polishing Apparatus with Hot Metals," SPIE,vol. 1325 Diamond Optics III, pp. 210-221.
S. Jin et al., "Polishing of CVD Diamond by Diffusional Reaction with Maganese Powder," Diamond and Related Materials,vol. 01, pp. 949-953, 1992.
B.C.H. Steele, "Oxygen Conductors and Their Technological Applications," Materials Science and Engineering,vol. B13, pp. 79-87, 1992.
S. Jin et al., "Massive Thinning of Diamond Thin Films by a Diffusion Process," Applied Physics Letters,vol. 60, No. 16, pp. 1948-1950, 1992.
Cuomo Jerome J.
Yehoda Joseph E.
International Business Machines - Corporation
Morris Daniel P.
Turner Archene
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