Method for plasma surface treating and preparation of membrane l

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427 38, B05D 306

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051205688

ABSTRACT:
A process for preparing membrane layers employing an apparatus suitable for plasma surface treating (e.g. forming a membrane layer on a substrate) which comprises a plasma generation section which is operable at least at substantially atmospheric pressure and is in communication via at least one plasma inlet (e.g. a nozzle) with an enclosed plasma treating section which is operable at a lower pressure than the plasma generation section, and wherein the plasma treating-section is in communication with an inlet for a fluid (e.g. polymerizable) reactant. A plasma beam generated in the apparatus and containing at least one fluid reactant impinges on the surface of a substrate to form a membrane layer.

REFERENCES:
patent: 4596718 (1986-06-01), Gruner
patent: 4957062 (1990-09-01), Schuurmans et al.
7th International Symposium on Plasma Chemistry, Jul. 1-5, 1985, vol. 2, "A New Approach of Plasma Deposition," G. M. W. Kroesen, pp. 698-703.
Boenig, H. V., "Plasma Science and Technology," Ithaca, N.Y., Cornell University Press, 1982, p. 18.

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