Method for plasma downstream processing

Details Method for plasma downstream processing Method for plasma downstream processing

1996-07-17

1998-05-12

Beck, Shrive

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427562, 427575, 216 69, C23C 1600

Patent

active

057502080

ABSTRACT:
A method for performing plasma downstream processing by generating plasma of an oxygen-containing gas with a microwave in a space having a thickness of 1/10, or less, of a wavelength .lambda. of the microwave, deriving the generated plasma of the oxygen containing gas from such space through an opening formed around the central portion of such plasma generating space through a gap having a loop-shaped cross section in a plane parallel to the space and folded cross section in a plane including a central portion normal to such space; and irradiating the generated plasma of the oxygen containing gas derived from the plasma generating space to an object to be processed.

REFERENCES:
patent: 4718976 (1988-01-01), Fujimura
patent: 4983254 (1991-01-01), Fujimura et al.
patent: 4987284 (1991-01-01), Fujimura et al.
patent: 5024182 (1991-06-01), Kobayashi et al.
patent: 5284544 (1994-02-01), Mizutani et al.
patent: 5389197 (1995-02-01), Ishimaru
patent: 5480533 (1996-01-01), Yoshida
patent: 5562775 (1996-10-01), Mihara
patent: 5575883 (1996-11-01), Nishikawa

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