Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
2005-08-23
2005-08-23
Kim, Peter B. (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S068000, C355S067000
Reexamination Certificate
active
06934007
ABSTRACT:
A method forms a feature pattern on a substrate by exposing the substrate, using a mask having a pattern of features thereon, with illumination having a first set of settings. The substrate is exposed a second time, using the same mask having the pattern of features thereon, with illumination having a second set of settings. The mask having the pattern of features thereon remains stationary between the two illumination exposures of the substrate.
REFERENCES:
patent: 5415835 (1995-05-01), Brueck et al.
patent: 5539568 (1996-07-01), Lin et al.
patent: 5635316 (1997-06-01), Dao
patent: 5766829 (1998-06-01), Cathey, Jr. et al.
patent: 5815247 (1998-09-01), Poschenrieder et al.
patent: 6184151 (2001-02-01), Adair et al.
patent: 6296987 (2001-10-01), Lin et al.
patent: 6479196 (2002-11-01), Levenson
patent: 6534242 (2003-03-01), Sugita et al.
patent: 6553562 (2003-04-01), Capodieci et al.
patent: 6563566 (2003-05-01), Rosenbluth et al.
patent: 2002/0036762 (2002-03-01), Nishi
patent: 2002/0045136 (2002-04-01), Fritze et al.
patent: 2003/0123039 (2003-07-01), Yen et al.
patent: 2003/0170565 (2003-09-01), Eurlings et al.
patent: 0 997 781 (1999-10-01), None
patent: 1 091 252 (2000-09-01), None
“0.11 um Imaging in KrF Lithography Using Dipole Illumination,” Eurlings et al.Lithography for Semiconductor Manufacturing II. 2001. vol. 4404.
“Model Assisted Double Dipole Decomposition,” Torres et al.Optical Microlithography XV. 2002. vol. 4691.
“Dipole Decomposition Mask-Design for Full Chip Implementation at the 100nm Technology Node and Beyond,” Hsu et al.Optical Microlithography XV. 2002. vol. 4691.
“Phase Phirst! An Improved Strong-PSM Paradigm,” Levenson et al.20thAnnual BACUS Symposium on Photomask Technology. 2001. vol. 4186.
“Optimization of Dipole Off-Axis Illumination by 1st-Order Efficiency Method for Sub-120 nm Node with KrF Lithography,” Kim et al.Jpn. J. Appl. Phys.2000. vol. 39.
“Optical Imaging Properties of Dense Phase Shift Feature Patterns,” Fritze et al.J. Vac. Sci. Technol.2002. vol. 20.
Fritze Michael
Tyrrell Brian
Gauthier & Connors LLP
Kim Peter B.
Massachusetts Institute of Technology
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