Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1997-07-31
1998-07-21
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
430311, 430314, 430315, 430319, 356400, 438 24, G01B 1100, G03F 900
Patent
active
057833400
ABSTRACT:
A method is disclosed for photolithographically defining device features up to the resolution limit of an auto-focusing projection stepper when the device features are to be formed in a wafer cavity at a depth exceeding the depth of focus of the stepper. The method uses a focusing cavity located in a die field at the position of a focusing light beam from the auto-focusing projection stepper, with the focusing cavity being of the same depth as one or more adjacent cavities wherein a semiconductor device is to be formed. The focusing cavity provides a bottom surface for referencing the focusing light beam and focusing the stepper at a predetermined depth below the surface of the wafer, whereat the device features are to be defined. As material layers are deposited in each device cavity to build up a semiconductor structure such as a microelectromechanical system (MEMS) device, the same material layers are deposited in the focusing cavity, raising the bottom surface and re-focusing the stepper for accurately defining additional device features in each succeeding material layer. The method is especially applicable for forming MEMS devices within a cavity or trench and integrating the MEMS devices with electronic circuitry fabricated on the wafer surface.
REFERENCES:
patent: 4580900 (1986-04-01), Larse
patent: 4615621 (1986-10-01), Allen
patent: 4814829 (1989-03-01), Kosugi
Farino Anthony J.
McWhorter Paul J.
Montague Stephen
Smith James H.
Sniegowski Jeffry J.
Hohimer John P.
Sandia Corporation
Young Christopher G.
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