Method for photo-mechanical composition of designs on stencils f

Details Method for photo-mechanical composition of designs on stencils f Method for photo-mechanical composition of designs on stencils f

1974-04-04

1976-01-27

Klein, David

Printing

Stenciling

Stencils

96 364, B41N 124, G03C 500

Patent

active

039345041

ABSTRACT:
To improve the detail on screen printing, in which images are applied to a printing grid or screen in which a photo-sensitive layer is utilized to be exposed in accordance with the image or composition to be printed, and the non-exposed image portions are removed before printing, the screen is pre-processed to provide it with a smooth surface so that the photo-sensitive layer can, itself, be applied on the screen with a smooth surface of uniform and controllable thickness directly over the printing grid; in a preferred form, the interstices of the printing grid or screen are filled with a filler, and the surface of the grid and the filler is then treated to remove that portion of the filler which is above the grid elements, leaving the filler within the interstices, and a smooth surface over which the photo-sensitive layer can be applied. A plurality of such applications can be made, the photo-sensitive surface itself being exposed to form a lattice screen, which is treated to provide a smooth surface on which a further photo-sensitive layer which is to be exposed with the image, can then be applied.

REFERENCES:
patent: 734120 (1903-07-01), Deeks
patent: 2064764 (1936-12-01), Playford et al.
patent: 2131225 (1938-09-01), Kirch et al.
patent: 2370874 (1945-03-01), Playford
patent: 2592789 (1952-04-01), Brennan
patent: 3532052 (1970-10-01), Erickson

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