Method for photo composition of large area integrated circuits

Details Method for photo composition of large area integrated circuits Method for photo composition of large area integrated circuits

1998-03-06

2000-10-24

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Plural exposure steps

430312, 430396, G03F 720

Patent

active

061365173

ABSTRACT:
A method for forming very large scale integrated circuit devices employs a reticle having plural discrete image fields which may be respectively blocked off and exposed to form patterns on an integrated circuit wafer substrate. The division of the circuit pattern to be imaged into separate image fields is based on repeatable horizontal, vertical and two dimensional structures in the overall circuit pattern of the integrated circuit. By repeatedly exposing image fields corresponding to repeatable structures, the size of the integrated circuit device may be scaled without requiring similar scaling of the reticle itself. Efficient exposure of an entire wafer may be provided by having image fields including circuit patterns which include the scribe lanes which separate the integrated circuits on the wafer to be imaged.

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"Modular CCDs: Building Blocks for large-area sensors" By Albert Theuwissen, Photonics Spectra, Jan. 1997.

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