Method for performing a vapor deposition process

Details Method for performing a vapor deposition process Method for performing a vapor deposition process

2011-01-11

2011-01-11

Turocy, David (Department: 1715)

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

C427S248100, C427S255360, C427S255391

Reexamination Certificate

active

07867560

ABSTRACT:
A method for performing a vapor deposition process is described. The vapor deposition process involves the deposition of a thin film, such as a ruthenium (Ru), rhenium (Re) or rhodium (Rh) film, on a substrate using a solid-phase or liquid-phase precursor. The method facilitates the initiation of gas lines to supply dilution gas(es), carrier gas(es) and precursor vapor to the deposition system, the pre-heating and heating of the substrate, the pre-conditioning of the film precursor vaporization system, and the flow stabilization of the carrier gas(es) and the precursor vapor, for example.

REFERENCES:
patent: 6924223 (2005-08-01), Yamasaki et al.
patent: 7794788 (2010-09-01), Suzuki
patent: 2004/0071897 (2004-04-01), Verplancken et al.
patent: 2008/0241381 (2008-10-01), Suzuki
Czekaj et al. Inorganic Chemsitry, vol. 27, 1988, pp. 8-10.

Affiliated with

Also associated with

Rating

Method for performing a vapor deposition process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for performing a vapor deposition process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for performing a vapor deposition process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2743523