Method for patterning metallo-organic percursor film and method

Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427504, 427510, 427525, 427526, 427533, 427552, 427 63, 505734, 505742, 156628, 156633, 156634, B05D 306, B05D 512, B44C 122, H01L 21306

Patent

active

052623920

ABSTRACT:
A method for patterning precursor film, a product thereof, a method for preparing a patterned ceramic film and a processing workpiece. The method for patterning precursor film includes the steps of depositing a blocking layer over the precursor film, patterning the overlaid blocking layer to uncover portions of the precursor film, irradiating the patterned blocking layer and uncovered portions of the precursor film with a beam sufficiently energetic to radiation modify the full thickness of unmasked portions of the precursor film and insufficiently energetic to radiation modify portions of the precursor film covered by the blocking layer, and developing the precursor film. The blocking layer has a lesser thickness than the precursor film, but is sufficiently thick to block an irradiating beam having the minimal energy necessary to radiation modify the full thickness of the precursor layer.

REFERENCES:
patent: 4289845 (1981-09-01), Bowden et al.
patent: 4301231 (1981-11-01), Atarashi et al.
patent: 4332879 (1982-06-01), Pastor et al.
patent: 4362598 (1982-12-01), Griffing
patent: 4383026 (1983-05-01), Hall
patent: 4396704 (1983-08-01), Taylor
patent: 4398964 (1983-08-01), Malwah
patent: 4426247 (1984-01-01), Tamamura et al.
patent: 4476216 (1984-10-01), Tobias
patent: 4481049 (1984-11-01), Reichmanis et al.
patent: 4589961 (1986-05-01), Gershenson
patent: 4657629 (1987-04-01), Bigelow
patent: 4715929 (1987-12-01), Ogawa
patent: 4770739 (1988-09-01), Orvek et al.
patent: 4863556 (1989-09-01), Reichert
patent: 4913769 (1990-04-01), Kanda et al.
patent: 4952556 (1990-08-01), Mantese et al.
patent: 4956335 (1990-09-01), Agostinelli et al.
patent: 5021398 (1991-06-01), Sharma et al.
Applied Physics Letters, vol. 52, No. 20, May 16, 1988, New York, pp. 1741-1742, Mantese et al, "Use of ion beams to decompose metal organics into patterned thin-film superconductors".
L. D. Jackel et al. Appl. Phys. Lett., vol. 39, Aug. 1, 1981, pp. 268-270.
M. E. Gross et al. Appl. Phys. Lett., vol. 53, Aug. 29, 1988, pp. 802-804.
J. V. Mantese et al. Appl. Phys. Lett., vol. 52, May 16, 1988, pp. 1741-1742.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for patterning metallo-organic percursor film and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for patterning metallo-organic percursor film and method , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for patterning metallo-organic percursor film and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-22549

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.