Method for patterning an X-ray master mask

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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430 22, 430313, 430323, 430396, G03F 900

Patent

active

055522475

ABSTRACT:
A method of patterning an X-ray master mask (21) is described by using reduction projection. An X-ray mask (21) is provided with a photoactive material coating a plating base layer (24). The X-ray mask (21) is positioned under the reduction projection tool. The photoactive material on the X-ray mask (21) is exposed from a pattern (13) in the reduction projection tool.

REFERENCES:
patent: 4855197 (1989-08-01), Zapka

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