Method for patching up thin-film transistor circuits on a...

Details Method for patching up thin-film transistor circuits on a... Method for patching up thin-film transistor circuits on a...

2007-01-12

2008-09-23

Geyer, Scott B. (Department: 2812)

Semiconductor device manufacturing: process

Repair or restoration

C257SE21160

Reexamination Certificate

active

07427516

ABSTRACT:
A method for patching up thin-film transistor (TFT) circuit patterns on a display panel comprises the following steps. Firstly, a mask having an opening is placed above the display panel and the opening corresponds to the location of the cracks of the circuits on the display panel. Subsequently, a plasma sputtering procedure is performed to deposit a metal thin film through the opening of the mask on the display panel so as to connect the broken circuits. When the metal thin film is covered on a plurality of the circuits, a laser cut-out procedure is performed to cut apart the metal thin film on the plurality of the circuits so as to prevent the different circuits from short circuits.

REFERENCES:
patent: 5429994 (1995-07-01), Ishikawa
“Laser chemical vapor deposition of film”, Zhou Zhenzhuo, Gu Yuangang, Qiu Mingzin, Laser Journal (vol. 6, No. 4), Jun. 4, 1985.
“Excimer laser-inducer deposition of manganese and tungsten thin film”, Xu Jie, Lii Xinming, Lou Qihong, Chinese Journal of Lasers, vol. 19, No. 5, May 1992.
“Ultrafine Powders Produced by U-V Laser Photolys of Iron Pentacarbonyl,” Lin et al., Journal Acta Physca Sinica, vol. 35, No. 9, pp. 1194-1198.

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