Method for overlay control system

Details Method for overlay control system Method for overlay control system

1997-11-14

1999-03-02

Hantis, K. P.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

430 22, 430 30, G01B 1100, G03F 900

Patent

active

058778616

ABSTRACT:
A method for overlay metrology and control. Simultaneous use of between-field overlay metrology to control field term alignment error at all levels and level-to-level metrology to control field term, grid term, and translation alignment errors at all levels is applied.

REFERENCES:
patent: 5468580 (1995-11-01), Tanaka
patent: 5656402 (1997-08-01), Kasuga
patent: 5783341 (1998-07-01), Vzawa

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