Optics: measuring and testing – Dimension
Reexamination Certificate
2007-12-06
2010-11-02
Lauchman, L. G (Department: 2877)
Optics: measuring and testing
Dimension
C356S445000, C700S121000, C702S081000, C702S085000, C702S159000, C702S172000
Reexamination Certificate
active
07826072
ABSTRACT:
The present application discloses a method of model-based measurement of semiconductor device features using a scatterometer system. The method includes at least the following steps. A cost function is defined depending upon a plurality of variable parameters of the scatterometer system and upon a plurality of variable parameters for computer-implemented modeling to determine measurement results. Constraints are established for the plurality of variable parameters of the scatterometer system and for the plurality of variable parameters for the computer-implemented modeling. A computer-implemented optimization procedure is performed to determine an optimized global set of parameters, including both the variable parameters of the scatterometer system and the variable parameters for the computer-implemented modeling, which result in a minimal value of the cost function. Finally, the optimized global set of parameters is applied to configure the scatterometer system and the computer-implemented modeling. Other embodiments, features and aspects are also disclosed herein.
REFERENCES:
patent: 6483580 (2002-11-01), Xu et al.
patent: 6577389 (2003-06-01), Biellak et al.
patent: 6614520 (2003-09-01), Bareket et al.
patent: 6931618 (2005-08-01), Tabery et al.
patent: 6967349 (2005-11-01), Bonifield et al.
patent: 6989896 (2006-01-01), Wen et al.
patent: 7069153 (2006-06-01), Johnson
patent: 7099005 (2006-08-01), Fabrikant et al.
patent: 7151594 (2006-12-01), Den Boef et al.
patent: 7171284 (2007-01-01), Vuong et al.
patent: 7221989 (2007-05-01), Prager et al.
patent: 7395132 (2008-07-01), Prager et al.
patent: 7525676 (2009-04-01), Pesar
patent: 7588949 (2009-09-01), Vuong et al.
patent: 7716003 (2010-05-01), Wack et al.
Bareket Noah
Hench John
Ratner Edward R.
Veldman Andrei
Wack Daniel C.
KLA-Tencor Technologies Corporation
Lauchman L. G
Okamoto & Benedicto LLP
LandOfFree
Method for optimizing the configuration of a scatterometry... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for optimizing the configuration of a scatterometry..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for optimizing the configuration of a scatterometry... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4193587