Method for optimizing NILS of exposed lines

Details Method for optimizing NILS of exposed lines Method for optimizing NILS of exposed lines

2005-12-20

2005-12-20

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S077000, C430S005000, C430S296000

Reexamination Certificate

active

06977715

ABSTRACT:
A method for optimizing NILS of exposed lines includes providing a photomask layout which has a first straight line and a second straight line parallel with the first straight line and is applied to a Quasar 90 illumination, and adding a first assist pattern between the first and second straight lines, wherein the first assist pattern has a plurality of geometric patterns with similar size arranging as a line parallel with the first straight line.

REFERENCES:
patent: 5242770 (1993-09-01), Chen et al.
patent: 6787272 (2004-09-01), Yu
patent: 2002/0192570 (2002-12-01), Smith
patent: 2004/0005089 (2004-01-01), Robles et al.
patent: 2004/0229133 (2004-11-01), Socha et al.
patent: 2005/0026047 (2005-02-01), Yang
patent: 2005/0028129 (2005-02-01), Hsu et al.

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