Method for optical proximity correction of a reticle to be...

Details Method for optical proximity correction of a reticle to be... Method for optical proximity correction of a reticle to be...

2011-03-08

2011-03-08

Young, Christopher G (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000

Reexamination Certificate

active

07901845

ABSTRACT:
A method for optical proximity correction of a design of a pattern on a surface is disclosed with the method comprising the steps of inputting desired patterns for the substrate and inputting a set of characters some of which are complex characters that may be used for forming the patterns on the surface. A method of creating glyphs is also disclosed.

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