Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-07-19
2011-07-19
Young, Christopher G (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S030000, C430S296000, C430S942000, C716S053000
Reexamination Certificate
active
07981575
ABSTRACT:
A method for optical proximity correction (OPC) of a desired pattern for a substrate is disclosed in which a plurality of variable shaped beam (VSB) shots are determined which can form on a surface an OPC-corrected version of the desired substrate pattern. Shots within the plurality of VSB shots are allowed to overlap each other. Dosages of the shots may also be allowed to vary with respect to each other. The union of the plurality of shots may deviate from the OPC-corrected version of the desired pattern for the substrate. In some embodiments, optimization may be used to minimize shot count. In other embodiments, the plurality of shots may be optionally selected from one or more pre-computed VSB shots or groups of VSB shots, that is, glyphs. A method for creating glyphs is also disclosed, in which patterns that would result on a surface from one or a group of VSB shots are pre-calculated.
REFERENCES:
patent: 4712013 (1987-12-01), Nishimura et al.
patent: 5082762 (1992-01-01), Takahashi
patent: 5804339 (1998-09-01), Kim
patent: 5885747 (1999-03-01), Yamasaki et al.
patent: 6049085 (2000-04-01), Ema
patent: 6087046 (2000-07-01), Nakasuji
patent: 6291119 (2001-09-01), Choi et al.
patent: 6544700 (2003-04-01), Ogino
patent: 6610989 (2003-08-01), Takahashi
patent: 6677089 (2004-01-01), Ogino et al.
patent: 6982135 (2006-01-01), Chang et al.
patent: 7901850 (2011-03-01), Fujimura et al.
patent: 2007/0196768 (2007-08-01), Ogino
patent: 2008/0116397 (2008-05-01), Yoshida et al.
patent: 2008/0116398 (2008-05-01), Hara et al.
patent: 2008/0116399 (2008-05-01), Fujimura
patent: 2008/0118852 (2008-05-01), Mitsuhashi
patent: 2008/0128637 (2008-06-01), Yoshida
patent: 2008/0203324 (2008-08-01), Fujimura et al.
patent: 1992-155337 (1992-05-01), None
patent: 1992155337 (1992-05-01), None
patent: 1020080001438 (2008-01-01), None
International Search Report and the Written Opinion of the International Searching Authority, Application No. PCT/US2009/053327, mailed Mar. 2, 2010.
Bloecker, M. et al., “Metrics to Assess Fracture Quality for Variable Shaped Beam Lithography”, Proceedings of SPIE, vol. 6349 (2006), pp. 63490Z-1-63490Z-10, SPIE, P.O. Box 10, Bellingham, WA. 98227, U.S.A.
Office Action dated Aug. 20, 2010 for U.S. Appl. No. 12/202,365.
International Preliminary Report on Patentability and Written Opinion dated Mar. 10, 2011 for PCT Application No. PCT/US2009/053327.
International Preliminary Report on Patentability and Written Opinion dated Mar. 10, 2011 for PCT Patent Application No. PCT/US2009/053328.
Notice of Allowance and Fee(s) due filed on Jan. 20, 2011 for U.S. Appl. No. 12/473,265.
Office action filed on Mar. 17, 2011 for U.S. Appl. No. 12/540,322.
Office Action filed on Mar. 18, 2011 for U.S. Appl. No. 12/540,321.
Office Action filed on Mar. 2, 2011 for U.S. Appl. No. 12/987,994.
Fujimura Akira
Glasser Lance
DS2, Inc.
The Mueller Law Office, P.C.
Young Christopher G
LandOfFree
Method for optical proximity correction of a reticle to be... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for optical proximity correction of a reticle to be..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for optical proximity correction of a reticle to be... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2685477