X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2007-11-13
2007-11-13
Porta, David (Department: 2884)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S070000, C378S087000, C378S090000, C250S390010, C250S390100
Reexamination Certificate
active
11522382
ABSTRACT:
A method for operating an X-ray or neutron-optical system and beam stop comprising an X-ray or neutron source (1) from which corresponding radiation is guided as a primary beam (2) to a sample (4) under investigation, with an X-ray or neutron detector (6) for receiving radiation diffracted or scattered from the sample (4), wherein the source (1), the sample and the detector are disposed substantially on one line (=z-axis) and wherein a beam stop (5; 31; 41) is provided between the sample and the detector whose cross-sectional shape is adjusted to the cross-section of the primary beam is characterized in that the beam stop is disposed to be displaceable along the z-direction for optimum adjustment of the amounts of useful and interfering radiation impinging on the detector. This protects the detector from the influence of the primary beam while allowing a maximum amount of diffracted or scattered radiation to reach the detector, wherein the beam stop can be easily adjusted to temporally changing properties of the beam optics.
REFERENCES:
patent: 6163592 (2000-12-01), He et al.
patent: 7139366 (2006-11-01), Jiang
patent: 2003/0219099 (2003-11-01), He et al.
Lange Joachim
Schipper Rolf-Dieter
Bruker AXS GmbH
Bryant Casey
Porta David
Vincent Paul
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