Electricity: electrical systems and devices – Safety and protection of systems and devices – Ground fault protection
Reexamination Certificate
2011-08-09
2011-08-09
Leja, Ronald W (Department: 2836)
Electricity: electrical systems and devices
Safety and protection of systems and devices
Ground fault protection
Reexamination Certificate
active
07995313
ABSTRACT:
An arc discharge in a plasma process is detected using a method that includes detecting arc discharges by monitoring one or more characteristic values of the plasma process, and comparing at least a first characteristic value with a predefinable first threshold value (SW1). When it is determined that the at least first characteristic value reaches the first threshold value, a potential arc discharge is recognized and a first countermeasure is triggered to suppress the arc discharge. The method includes comparing at least a second characteristic value with a pre-definable second threshold value (SW2) that differs from the first threshold value, and when it is determined that the second characteristic value reaches the second threshold value, triggering a second countermeasure for suppressing the arc discharge. After the second countermeasure has been triggered, a renewed triggering of the second countermeasure is prevented during a blocking time (Tt).
REFERENCES:
patent: 4031464 (1977-06-01), Norberg
patent: 4396478 (1983-08-01), Aizenshtein et al.
patent: 4588952 (1986-05-01), Matsuoka
patent: 4625283 (1986-11-01), Hurley
patent: 4694402 (1987-09-01), McEachern et al.
patent: 4936960 (1990-06-01), Siefkes et al.
patent: 5192894 (1993-03-01), Teschner
patent: 5241152 (1993-08-01), Anderson et al.
patent: 5543689 (1996-08-01), Ohta et al.
patent: 5576939 (1996-11-01), Drummond
patent: 5611899 (1997-03-01), Maass
patent: 5698082 (1997-12-01), Teschner et al.
patent: 5718813 (1998-02-01), Drummond et al.
patent: 5729145 (1998-03-01), Blades
patent: 5804975 (1998-09-01), Alers et al.
patent: 5889391 (1999-03-01), Coleman
patent: 5993615 (1999-11-01), Abry et al.
patent: 6007879 (1999-12-01), Scholl
patent: 6060837 (2000-05-01), Richardson et al.
patent: 6063245 (2000-05-01), Frach et al.
patent: 6162332 (2000-12-01), Chiu
patent: 6213050 (2001-04-01), Liu et al.
patent: 6332961 (2001-12-01), Johnson et al.
patent: 6416638 (2002-07-01), Kuriyama et al.
patent: 6420863 (2002-07-01), Milde et al.
patent: 6472822 (2002-10-01), Chen et al.
patent: 6535785 (2003-03-01), Johnson et al.
patent: 6545420 (2003-04-01), Collins et al.
patent: 6621674 (2003-09-01), Zahringer et al.
patent: 6633017 (2003-10-01), Drummond et al.
patent: 6736944 (2004-05-01), Buda
patent: 6740207 (2004-05-01), Kloeppel et al.
patent: 6753499 (2004-06-01), Yasaka et al.
patent: 6783795 (2004-08-01), Inoue et al.
patent: 6791274 (2004-09-01), Hauer et al.
patent: 6859042 (2005-02-01), Parker
patent: 6878248 (2005-04-01), Signer et al.
patent: 6943317 (2005-09-01), Ilic et al.
patent: 6967305 (2005-11-01), Sellers
patent: 7016172 (2006-03-01), Escoda
patent: 7081598 (2006-07-01), Ilic et al.
patent: 7262606 (2007-08-01), Axenbeck et al.
patent: 7301286 (2007-11-01), Kuriyama
patent: 7408750 (2008-08-01), Pellon et al.
patent: 2004/0031699 (2004-02-01), Shoji
patent: 2004/0079733 (2004-04-01), Kawaguchi et al.
patent: 2004/0182697 (2004-09-01), Buda
patent: 2004/0212312 (2004-10-01), Chistyakov
patent: 2005/0051270 (2005-03-01), Sasaki et al.
patent: 2005/0093459 (2005-05-01), Kishinevsky
patent: 2005/0135025 (2005-06-01), Escoda
patent: 2006/0011473 (2006-01-01), Kuriyama et al.
patent: 2006/0054601 (2006-03-01), Ilic et al.
patent: 2006/0100824 (2006-05-01), Moriya
patent: 2006/0181816 (2006-08-01), Pellon et al.
patent: 2006/0213761 (2006-09-01), Axenbeck et al.
patent: 2006/0241879 (2006-10-01), van Zyl
patent: 2007/0073498 (2007-03-01), Winterhalter et al.
patent: 2007/0121267 (2007-05-01), Kotani et al.
patent: 2007/0168143 (2007-07-01), Axenbeck et al.
patent: 2007/0251813 (2007-11-01), Ilic et al.
patent: 2008/0121625 (2008-05-01), Zaehringer
patent: 2008/0122369 (2008-05-01), Nitschke
patent: 2008/0133154 (2008-06-01), Krauss
patent: 2008/0216745 (2008-09-01), Wiedemuth et al.
patent: 2008/0218923 (2008-09-01), Wiedemuth
patent: 2008/0257869 (2008-10-01), Nitschke et al.
patent: 4127504 (1993-02-01), None
patent: 43 26 100 (1995-02-01), None
patent: 44 20 951 (1995-12-01), None
patent: 19651615 (1997-07-01), None
patent: 19848636 (2000-05-01), None
patent: 10034895 (2002-02-01), None
patent: 10119058 (2002-10-01), None
patent: 102004015090 (2005-11-01), None
patent: 102006002333 (2007-07-01), None
patent: 0713242 (1996-05-01), None
patent: 0 967 697 (1999-12-01), None
patent: 1 121 705 (2001-08-01), None
patent: 0 692 138 (2004-01-01), None
patent: 1 441 576 (2004-07-01), None
patent: 1705687 (2006-09-01), None
patent: 1720195 (2006-11-01), None
patent: 06132095 (1994-05-01), None
patent: 08-167500 (1996-06-01), None
patent: 08222398 (1996-08-01), None
patent: 09170079 (1997-06-01), None
patent: 2000117146 (2000-04-01), None
patent: 2005077248 (2005-03-01), None
patent: WO 94/25977 (1994-11-01), None
patent: WO 01/13402 (2001-02-01), None
patent: WO 03/037047 (2003-05-01), None
patent: WO 03/088445 (2003-10-01), None
patent: WO 2006/014212 (2006-02-01), None
patent: W02006116445 (2006-11-01), None
Zlatanovic et al., “Glow-to-Arc Transition Instability Sensor in Processing Plasma”, Proc. 10thInternational Conference on Microelectronics, MIEL'95, vol. 2, Serbia, Sep. 1995, pp. 597-600.
Search Report from corresponding European Application No. 06024306.0, mailed Apr. 23, 2007, 8 pages.
Ochs et al., “Advanced Power Supplies designed for Plasma Deposition and Etching”, Vakuum in Forschung und Praxis, vol. 8, No. 5, Sep. 26, 2006, pp. 32-36.
Van Zyl et al., “Managing Arcs in RF Powered Plasma Processes”, Society of Vacuum Coaters, 48thAnnual Technical Conference Proceedings, 2005, pp. 44-49.
Zlatanovic et al., “Glow-to-Arc Transition Instability Sensor in Processing Plasma”, Proc. 20thInternational Conference on Microelectronics, vol. 2, Sep. 12-14, 1995, pp. 597-600.
Translation of Office Action from correspondence Japanese Application No. 2007-504279, dated Sep. 28, 2009, 4 pages.
Fish & Richardson P.C.
Huettinger Elektronik GmbH & Co. KG
Leja Ronald W
LandOfFree
Method for operating a plasma process and arc discharge... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for operating a plasma process and arc discharge..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for operating a plasma process and arc discharge... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2676653