Method for operating a magnetron sputtering apparatus

Details Method for operating a magnetron sputtering apparatus Method for operating a magnetron sputtering apparatus

1981-08-06

1983-10-04

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, C23C 1500

Patent

active

044077084

ABSTRACT:
An improved magnetron sputter source (10) in which a temperature sensor (94) is placed within the cathode (18) adjacent the interface between the cathode and the sputter target (16) at the point of maximum erosion of the target. A relationship between the temperature of the cathode and the thickness of the target at that point is established so that the temperature reading can be used as an indication that the target is about to be eroded through.

REFERENCES:
patent: 4198283 (1980-04-01), Class et al.
patent: 4200510 (1980-04-01), O'Connell et al.
patent: 4219397 (1980-08-01), Clarke
patent: 4324631 (1982-04-01), Meckel et al.

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