Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2005-09-30
2010-06-08
Duda, Kathleen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C716S030000, C716S030000
Reexamination Certificate
active
07732108
ABSTRACT:
A method for generating or refining an OPC model for use in wafer fabrication. A predetermined feature layout is used to prepare a mask for use in, for example, a photolithographic process. The mask is used to create structures corresponding to mask features on a semiconductor wafer using the mask. Measurements of the actual mask features and wafer features may then be assessed and correlated, and the results used to generate an OPC model or refine an existing one. In addition, the OPC may be used to simulate a fabrication operation by applying the OPC tool to a predetermined layout to produce a mask image and a wafer image, and then comparing the predetermined layout to the simulated wafer image to determine at least one fitness value.
REFERENCES:
patent: 6602728 (2003-08-01), Liebmann et al.
patent: 2005/0210437 (2005-09-01), Shi et al.
patent: 2006/0141366 (2006-06-01), Parikh et al.
Park, O. et al., “Model Based OPC Considering Process Window Aspects—a Study,” Deep Submicron Technical Publication, www.mentor.com/dsm, Sep. 2002, 12 pp.
Duda Kathleen
Infineon - Technologies AG
Raymond Brittany
Slater & Matsil L.L.P.
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