Coating processes – Electrical product produced – Condenser or capacitor
Patent
1997-12-23
2000-01-04
King, Roy V.
Coating processes
Electrical product produced
Condenser or capacitor
42725531, 427261, 427269, 427309, 427327, 427553, B05D 500
Patent
active
060107448
ABSTRACT:
A method is described for the nucleation controlled deposition of ferroelectric thin films by chemical vapor deposition in a novel processing sequence wherein a higher density of bismuth nucleation sites is achieved either by the use of a substrate member which has been treated in a manner to yield a controllably and reproducible rough surface on which SBT films with excellent properties may be produced or by using a chemically modified substrate surface upon which surface chemical properties are modified. Typical techniques for achieving surface roughening include reactive ion etching, inert ion milling and chemical mechanical polishing, each of which may be used to delineate patterned bottom electrodes. The chemical properties of the substrate may be modified by alloy deposition, deposition of seed layers which are then partially or completely in-diffused ion implantation with or without heat treatment and changing the chemistry of the surface by a pre-exposure to chemical agents prior to deposition. The resultant oxide ferroelectric thin films are suitable for use in capacitors, memory devices and the like.
REFERENCES:
patent: 5555486 (1996-09-01), Kingon et al.
patent: 5789268 (1998-08-01), Chivukula et al.
patent: 5817532 (1998-10-01), Joo et al.
Baum Thomas H.
Buskirk Peter Van
Hendrix Bryan
Hintermaier Frank
Roeder Jeff
Advanced Technology & Materials Inc.
Chin Dexter
Infineon Technolgies Corporation
King Roy V.
Zitzmann Oliver A.
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