Method for neutralizing acidic novolak resin in a lithographic c

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430176, 430192, 430270, 430906, 430905, 430168, 430191, 430327, 528492, 528488, 528489, G03C 1495, G03C 152

Patent

active

047216654

ABSTRACT:
The invention features a lithographic composition fabricated from a process wherein an acidic novolak resin is neutralized in solution. The solution comprises a common compatible solvent with the other ingredients of the coating composition, such as a positive sensitizer, a color changing dye, and a light activated, acid-releasing compound.

REFERENCES:
patent: 1868079 (1932-07-01), Seebach
patent: 4196003 (1980-04-01), Watanabe
patent: 4348471 (1982-09-01), Shelnut et al.
patent: 4350753 (1982-09-01), Shelnut et al.
patent: 4513077 (1985-04-01), Isobe et al.

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