Method for neutralizing acidic novolak resin in a lithographic c

Details Method for neutralizing acidic novolak resin in a lithographic c Method for neutralizing acidic novolak resin in a lithographic c

1986-09-29

1988-01-26

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430176, 430192, 430270, 430906, 430905, 430168, 430191, 430327, 528492, 528488, 528489, G03C 1495, G03C 152

Patent

active

047216654

ABSTRACT:
The invention features a lithographic composition fabricated from a process wherein an acidic novolak resin is neutralized in solution. The solution comprises a common compatible solvent with the other ingredients of the coating composition, such as a positive sensitizer, a color changing dye, and a light activated, acid-releasing compound.

REFERENCES:
patent: 1868079 (1932-07-01), Seebach
patent: 4196003 (1980-04-01), Watanabe
patent: 4348471 (1982-09-01), Shelnut et al.
patent: 4350753 (1982-09-01), Shelnut et al.
patent: 4513077 (1985-04-01), Isobe et al.

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