Method for mounting a wafer to a submount

Adhesive bonding and miscellaneous chemical manufacture – Methods – Surface bonding and/or assembly therefor

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Details

148DIG12, 156160, 156286, 156381, 437212, B32B 3120, H01L 21447

Patent

active

053001753

ABSTRACT:
A semiconductor wafer (40) is placed in a first pressure chamber (37) of a bonding apparatus (10 or 60). A major surface (46) of a submount (44) is placed on a submount support (30 or 62). The major surface (46) of the submount (44) seals the first pressure chamber (37). A pressure differential is generated between the first pressure chamber (37) and a second pressure chamber (47) The pressure differential bows a central portion of the submount (44) toward the semiconductor wafer (40). The central portion of the submount (44) contacts an adhesive coating over a central portion of the semiconductor wafer (40). The submount support (30 or 62) is displaced to decrease a curvature on the submount (44). The pressure differential is increased to an end-point to facilitate bond formation between the semiconductor wafer (40) and the submount (44).

REFERENCES:
patent: 3322598 (1967-05-01), Marks et al.
patent: 3475867 (1969-11-01), Walsh
patent: 3492763 (1970-02-01), Walsh
patent: 4152188 (1979-05-01), Friedrich et al.
patent: 4283242 (1981-08-01), Regler
patent: 4316757 (1982-02-01), Walsh
patent: 4714511 (1987-12-01), Nakao
patent: 4752180 (1988-06-01), Yoshikawa
patent: 5129827 (1992-07-01), Hoshi

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