Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined
Reexamination Certificate
2005-01-26
2008-12-02
Pert, Evan (Department: 2826)
Coating processes
Measuring, testing, or indicating
Thickness or uniformity of thickness determined
C427S248100, C438S014000, C438S758000, C438S778000
Reexamination Certificate
active
07459175
ABSTRACT:
An adaptive real time thermal processing system is presented that includes a multivariable controller. The method includes creating a dynamic model of the MLD processing system and incorporating virtual sensors in the dynamic model. The method includes using process recipes comprising intelligent set points, dynamic models, and/or virtual sensors.
REFERENCES:
patent: 6174377 (2001-01-01), Doering et al.
patent: 6441350 (2002-08-01), Stoddard et al.
patent: 6913938 (2005-07-01), Shanmugasundram et al.
patent: 2002/0018849 (2002-02-01), George et al.
patent: 2003/0173635 (2003-09-01), Akram et al.
patent: 2003/0219528 (2003-11-01), Carpenter et al.
patent: 2005/0149886 (2005-07-01), Kaushal et al.
patent: WO02081771 (2002-10-01), None
patent: WO02004077515 (2004-09-01), None
patent: WO02005067006 (2005-07-01), None
Sofge, Virtual sensor based fault detection and classification on a plasma etch reactor, The second joint mexico-US international workshop on neural networks and neurocontrol, 1997, pp. 1-7.
European Patent Office, Search Report and Written Opinion for corresponding PCT Application No. PCT/US2005/046432, Jun. 21, 2006, 10 pp.
Kaushal Sanjeev
Pandey Pradeep
Sugishima Kenji
Pert Evan
Tokyo Electron Limited
Wood Herron & Evans LLP
LandOfFree
Method for monolayer deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for monolayer deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for monolayer deposition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4021978