Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1996-11-13
1998-11-17
Anderson, Bruce
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
2504911, H01J 3700
Patent
active
058380132
ABSTRACT:
A method for monitoring resist charging in an electron beam lithography system is disclosed. The method involves the use of a reference plate (REFP) registration scheme in which a resist-coated REFP having registration marks on a substrate is prepared and scanned. The scanning process includes the deposition of an amount of charge on the surface. Then the REFP is coated with a resist to be tested and scanned again. The difference between the two scans is calculated. Preferably, each scan is performed first with the stage moving in a forward-ordered serpentine path in the tool to determine the perceived positions of the registration marks and then in a backward-ordered serpentine path. As the tool's stage moves from field to field, a small charge is deposited on the REFP to simulate the effect of a writing process. The difference between the forward and reverse scan position measurements is then determined. As any intrinsic positional errors in measurement will cancel out, the forward/backward error provides a monitor of the magnitude of resist charging.
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Butsch Rainer
Enichen William A.
Gordon Michael S.
Hartley John G.
Anderson Bruce
Capella Steven
International Business Machines - Corporation
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