Chemistry: electrical and wave energy – Processes and products
Patent
1984-02-13
1988-02-16
Kaplan, G. L.
Chemistry: electrical and wave energy
Processes and products
204434, 427 10, G01N 2748
Patent
active
047253398
ABSTRACT:
A rotating disk electrode system operates at constant speed in a solution whose metal ion concentration is held constant at multiple concentrations within a range of concentration. The current at the working electrode is recorded, while the potential at the working electrode is swept at a predetermined rate for each of the concentration values. The diffusion limiting current is determined for each of the concentration values. Then the rotating disk electrode system is operated continuously in a metal plating bath whose metal ion concentration can vary. A voltage applied to the working electrode produces a current at the electrode whose magnitude is compared to the values of the previous calibration to determine the current metal ion concentration. Alternatively, a rotating disk electrode system is operated over a range of speeds in a solution whose ion concentration is held constant over a range of concentration. Current at the working electrode is measured for a given electric potential applied to the working electrode. In this way, a calibration relationship between the current at the electrode and the range of metal ion concentrations is established which can be used with current measured in the plating bath under the same conditions as those that established the calibration curve to predict the concentration of the bath.
REFERENCES:
patent: 3925168 (1975-12-01), Costas
patent: 4055751 (1977-10-01), Bussmann et al.
patent: 4132605 (1979-01-01), Tench et al.
patent: 4146437 (1979-03-01), O'Keefe
patent: 4153521 (1979-05-01), Litvak et al.
patent: 4276323 (1981-06-01), Oka et al.
patent: 4324621 (1982-04-01), Kerby
patent: 4336111 (1982-06-01), Graunke
patent: 4406248 (1983-09-01), Araki et al.
patent: 4406249 (1983-09-01), Araki et al.
Bindra Perminder
Levine Solomon L.
Light David N.
Abzug Jesse L.
International Business Machines - Corporation
Kaplan G. L.
LaBaw Jeffrey S.
Smith Marilyn D.
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