Method for modifying the film of a photosensitive chemical mater

Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate

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427256, 427384, 427553, 427558, 427581, 427582, B05D 300

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active

057119996

ABSTRACT:
A method is provided for modifying a photosensitive chemical material which controls exposure to make spectral intensity ratio constant, adjusts the pre-tilt angles of a liquid crystal orientation film easily and accurately, and gives desired properties to the photosensitive chemical material. A photosensitive chemical material is patterned by the photochemical reaction of a photosensitive chemical material. The photosensitive chemical material is irradiated with light emitted from a light source having a line spectrum having almost single wavelength between 200 nm and 300 nm (for example, a low pressure mercury lamp or a laser lamp) according to a pattern to control the reaction of the photosensitive chemical material. Also, the photosensitive chemical material is irradiated with light having a wavelength of 300 nm or longer to make the photosensitive chemical material cause a reaction to occur that selectively generates active oxygen. Also, the photosensitive chemical material is irradiated with ultraviolet light in an atmospheric gas containing desired functional groups in order to introduce the functional groups into the positions of radicals generated by the decomposition reaction of the photosensitive chemical material due to photochemical reaction.

REFERENCES:
patent: 4631199 (1986-12-01), Hall et al.
patent: 4685976 (1987-08-01), Schachameyer
patent: 5153023 (1992-10-01), Orlowski et al.
patent: 5281450 (1994-01-01), Yaniv
patent: 5308651 (1994-05-01), Ohta et al.
patent: 5510158 (1996-04-01), Hiramoto et al.
patent: 5587200 (1996-12-01), Lorenz et al.
patent: 5593739 (1997-01-01), Kickelhain

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