Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1996-08-28
1998-01-27
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427256, 427384, 427553, 427558, 427581, 427582, B05D 300
Patent
active
057119996
ABSTRACT:
A method is provided for modifying a photosensitive chemical material which controls exposure to make spectral intensity ratio constant, adjusts the pre-tilt angles of a liquid crystal orientation film easily and accurately, and gives desired properties to the photosensitive chemical material. A photosensitive chemical material is patterned by the photochemical reaction of a photosensitive chemical material. The photosensitive chemical material is irradiated with light emitted from a light source having a line spectrum having almost single wavelength between 200 nm and 300 nm (for example, a low pressure mercury lamp or a laser lamp) according to a pattern to control the reaction of the photosensitive chemical material. Also, the photosensitive chemical material is irradiated with light having a wavelength of 300 nm or longer to make the photosensitive chemical material cause a reaction to occur that selectively generates active oxygen. Also, the photosensitive chemical material is irradiated with ultraviolet light in an atmospheric gas containing desired functional groups in order to introduce the functional groups into the positions of radicals generated by the decomposition reaction of the photosensitive chemical material due to photochemical reaction.
REFERENCES:
patent: 4631199 (1986-12-01), Hall et al.
patent: 4685976 (1987-08-01), Schachameyer
patent: 5153023 (1992-10-01), Orlowski et al.
patent: 5281450 (1994-01-01), Yaniv
patent: 5308651 (1994-05-01), Ohta et al.
patent: 5510158 (1996-04-01), Hiramoto et al.
patent: 5587200 (1996-12-01), Lorenz et al.
patent: 5593739 (1997-01-01), Kickelhain
Taira Yoichi
Yamada Fumiaki
Drumheller Ronald L.
International Business Machines - Corporation
Pianalto Bernard
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