Method for measuring thickness of thin film, method for...

Optics: measuring and testing – Dimension – Thickness

Reexamination Certificate

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C356S432000

Reexamination Certificate

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07542152

ABSTRACT:
A laser light is projected to a thin film deposited on a transparent substrate, and measurement is performed on the entire measurement area of the substrate, and transmission intensity is measured by a transmission light intensity monitor and reflection light intensity is measured by a reflection light intensity monitor at the same points and at the same number of points on the substrate. From the value of “A=1−(R+T)” where R represents reflectivity and T is transmissivity, film thickness is measured and evaluated from the relation of the value A with film thickness. By this procedure, film thickness can be determined on 10,000 substrates or more per minute and film thickness of thin film can be measured over the entire substrate surface.

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patent: 2003-258349 (2003-09-01), None
Simultaneous And Independent Determination of the Refractive Index and the Thickness of Thin Films by Ellipsometry, Vedam et al, Journal of the Optical Society Of America, vol. 58, No. 4, Apr. 1968.
Multiple Determination of the Optical Constants of Thin-Film Coating Materials, Arndt, et al, Applied Optics, Oct. 15, 1984, vol. 23, No. 20.

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